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Automotive LED industry drivers: Disruptive technologies and consumer behavior changes
05/20/2016The lighting market for automotive applications should reach a 23.7% compound annual growth rate (CAGR) 2015-2121 ...
EUVL: Taking it down to 5nm
05/17/2016The semiconductor industry is nothing if not persistent — it’s been working away at developing extreme ultraviolet lithography (EUVL) for many years....
IBM scientists achieve storage memory breakthrough
05/18/2016For the first time, scientists at IBM Research have demonstrated reliably storing 3 bits of data per cell using a relatively new memory technology kno...
Seven Top-20 semiconductor suppliers show double-digit declines
05/12/2016Qualcomm, Micron, and SK Hynix registered ≥25% drops, with total top-20 sales off by 6%....


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Tech Papers
Upcoming Webcasts
Fan-Out Wafer Level Packaging
May 26, 2016 at 1 PM ET / Sponsored by Zeta Instruments Wafer level packaging (WLP) using fan-out...
High Mobility Transistors
June 21, 2016 at 1 PM ET / Sponsored by Air Products Transistor performance has been greatly improved...

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NEWS ANALYSIS & FEATURES


Soitec announces with withdrawal of Silicon Genesis' patent lawsuit

05/23/2016  Silicon Genesis Corporation (SiGen) filed a motion to terminate the investigation by the U.S. International Trade Commission (ITC) in its entirety on the basis of the withdrawal of its complaint directed to silicon-on-insulator (SOI) wafers sold and imported into the United States by Soitec.

First Strategic Materials Conference in Korea: A success

05/23/2016  SEMI announced today that the first SEMI Strategic Materials Conference (SMC) was held in Korea COEX in Seoul on May 18.

Mike Noonen joins Silego Technology

05/23/2016  Silego Technology, the Configurable Mixed-signal Integrated Circuit (CMIC) pioneer, today announced the appointment of Mike Noonen to lead sales and business development.

GLOBALFOUNDRIES releases performance-enhanced 130nm SiGe RF technology

05/23/2016  GLOBALFOUNDRIES today announced a next-generation radio-frequency (RF) silicon solution for its Silicon Germanium (SiGe) high-performance technology portfolio.

As large display unit shipments decline, shipment area rises with aggressive size migration for TVs

05/20/2016  Despite unit-shipment declines, large thin-film transistor (TFT) liquid crystal display (LCD) shipment area is expected to grow 5 percent year over year, to reach 168 million square meters in 2016.

ORNL demonstrates large-scale technique to produce quantum dots

05/20/2016  A method to produce significant amounts of semiconducting nanoparticles for light-emitting displays, sensors, solar panels and biomedical applications has gained momentum with a demonstration by researchers at the Department of Energy's Oak Ridge National Laboratory.

Synopsys' Custom Compiler enabled for Samsung Foundry's 14nm finFET process

05/20/2016  Synopsys, Inc. today announced that the company's Custom Compiler tool has been enabled by Samsung for 14 nanometer (nm) LPP and LPC FinFET production.

Graphene: A quantum of current

05/20/2016  Viennese scientists unravel the quantum properties of the carbon material graphene.

Fujitsu boosts efficiency of manufacturing processes at Shimane Fujitsu through IoT collaboration with Intel

05/19/2016  Fujitsu Limited today announced that it has with Intel Corporation carried out a field trial to visualize manufacturing processes at Shimane Fujitsu Limited.

STMicroelectronics, Arduino launch cooperation to expand maker-community access to STM32 MCUs and sensors

05/19/2016  Moving to enable makers to make even more than before, STMicroelectronics and Arduino today announced an agreement that brings the STM32 family of microcontrollers (MCU), along with ST's full portfolio of sensing, power, and connectivity technology, even closer to the Arduino maker community.

$88M in Series E financing for OLED production equipment maker, Kateeva

05/19/2016  Kateeva today announced that it has closed its Series E funding round with $88 million in new financing.

New type of graphene-based transistor will increase the clock speed of processors

05/18/2016  Scientists have developed a new type of graphene-based transistor and using modeling they have demonstrated that it has ultralow power consumption compared with other similar transistor devices.

Exagan signs partnership agreement to establish GaN's reliability for use in power electronics

05/18/2016  Exagan announced a strategic partnership to develop and commercialize GaN-on-silicon products with HIREX Engineering.

The CEA announces expanded collaboration with Intel

05/18/2016  The CEA (Atomic Energy Commission) and Intel are boosting their collaboration through a new R&D agreement signed in Paris on Thursday 12 May.

Imec expands its silicon platform for quantum computing applications

05/18/2016  At the Quantum Europe conference, taking place in Amsterdam, Belgian's nanoelectronincs research center imec announced today that it is ramping-up its R&D activities focused on quantum computing.

IBM keynoter outlines disruptive "Economy of Things" at SEMI’s ASMC 2016

05/18/2016  The 27th annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2016), opened today (May 17) in Saratoga Springs, New York.

IQE joins imec's GaN-on-Si Industrial Affiliation Program

05/17/2016  Nanoelectronics research center imec today announced a strategic partnership on GaN-on-Si (Gallium Nitride-on-Silicon) technology with IQE, a designer and manufacturer of advanced semiconductor wafer products and services.

TowerJazz begins mass producing new integrated SiGe-based "front-end module on a chip" RF platform for IoT applications

05/17/2016  TowerJazz today announced volume production of a new RF technology capable of integrating a wireless front-end module (FEM) on a single chip, tailored to meet the challenges of Internet of Things (IoT) applications.

Ultratech Cambridge Nanotech forms research collaboration with Northeastern University

05/17/2016  Ultratech, Inc. announced the formation of a research collaboration with Professor Thomas J. Webster, Ph.D. at Northeastern University, to study the use of nano-materials produced via ALD for medical applications.

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Ultratech Cambridge Nanotech forms research collaboration with Northeastern University

05/17/2016  Ultratech, Inc. announced the formation of a research collaboration with Professor Thomas J. Webster, Ph.D. at Northeastern University, to study the use of nano-materials produced via ALD for medical applications.



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VIDEOS

RECOMMENDED TECHNOLOGY PAPERS

Specialized Materials Meet Critical Packaging Needs in MEMS Devices

Microelectromechanical systems (MEMS) present both unique market opportunities and significant manufacturing challenges for product designers in nearly every application segment. Used as accelerometers, pressure sensors, optical devices, microfluidic devices, and more, these microfabricated sensors and actuators often need to be exposed to the environment, but also need to be protected from environmental factors. Although standard semiconductor manufacturing methods provide a baseline capability in meeting these challenges, the unique requirements of MEMS devices drive a need for specialized epoxies and adhesives able to satisfy often-conflicting demands.May 12, 2016
Sponsored by Master Bond, Inc.,

Protecting Electronics with Parylene

This whitepaper provides a comprehensive overview of parylene conformal coating, advantages of parylene, and applications for parylene to protect electronic devices. As technology continues to advance, devices will encounter rugged environments and it is vital that they are properly protected. Parylene conformal coating is one way that manufacturers are giving their devices a higher level of protection, along with increasing the overall quality of their products. Parylene conformal coating applications for Electronics include: · I/O & PCI Modules · Power Converters and Supplies · Backplanes · Other Embedded Computing applications · Other specialty electronics and assemblies April 26, 2016
Sponsored by Diamond-MT

NMT: A Novel Technology for In-Line Ultra-Thin Film Measurements

XwinSys identified the semiconductors recent market trends and developed a novel XRF technology, named NMT: Noise-reduced Multilayer Thin-film measurement. This innovative approach can be used for in-line inspection and metrology features, to accurately and precisely analyze single and multi-layered elements in ultra-thin films. NMT novel technology can be utilized for in-line applications ranging from localized ultra-thin film stacks to the inspection of 3D localized features to the analysis of defects involving geometries, voids and material elements. February 23, 2016
Sponsored by XwinSys Technology Development Ltd.

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WEBCASTS

Fan-Out Wafer Level Packaging

May 26, 2016 at 1 PM ET / Sponsored by Zeta Instruments

Wafer level packaging (WLP) using fan-out technology is an attractive platform for achieving low-cost low-profile package solutions for smart-phones and tablets, which require cost-effective, high-density interconnects in small form-factor packaging. Assembled directly on a silicon wafer, the approach is unconstrained by die size, providing the design flexibility to accommodate an unlimited number of interconnects between the package and the application board for maximum connection density, finer line/spacing, improved electrical and thermal performance and small package dimensions to meet the relentless form factor requirements and performance demands of the mobile market. In this webcast, industry experts will explain the FOWLP process, discuss recent advances and forecast future trends.

Sponsored By:
High Mobility Transistors

June 21, 2016 at 1 PM ET / Sponsored by Air Products

Transistor performance has been greatly improved with strained silicon and high-k metal gates. Further performance improvements could be had by implementing III-V materials in the channel of nMOS transistors. Both III-V and Ge-based channels being considered for the pMOS device. High electron-mobility III-V semiconductors have been intensely researched as alternative channel materials for sub-7 nm technology nodes, but one of the main stumbling blocks is how to integrate them monolithically and cost-effectively with traditional CMOS silicon technology. This webcast will discuss the latest efforts in this area, including vertically stacked III-V nanowire.

Sponsored By:
Interconnection Technologies

June 2016 (Date and time TBD)/Sponsored by Air Products

This webcast will examine the state-of-the-art in conductors and dielectrics, -- including contacts and Metal1 through global level -- pre-metal dielectrics, associated planarization, necessary etch, strip and cleans, embedded passives, global and intermediate TSVs for 3D, as well as reliability, system, and performance issues.

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June 12, 2016 - July 15, 2016
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July 12, 2016 - July 14, 2016
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Edwards launches new vacuum pumps at SEMICON China 2016
03/15/2016Edwards announced the availability of two new vacuum pump product families at SEMICON China: the iXM Series for semiconductor etch and chemical v...
Low-outgassing Faraday Isolators to improve lifetime and reliability of optical systems
02/18/2016Qioptiq, an Excelitas Technologies company introduces the LINOS Low-outgassing Faraday Isolators, the first of th...
Versatile high throughput SEM from JEOL
11/04/2015JEOL's new JSM-IT100 is the latest addition to its InTouchScope Series of Scanning Electron Microscopes....