NEWS ANALYSIS & FEATURES


M+W Group presents an integrated waste program for semiconductor facilities

09/08/2016  The global high-tech engineering and construction company M+W Group has presented current and future trends, as well as state of the art solutions, for an integrated approach to waste reduction in order to improve the sustainability of semiconductor fabs

GLOBALFOUNDRIES unveils ecosystem partner program to accelerate innovation for tomorrow's connected systems

09/08/2016  GLOBALFOUNDRIES today announced a new partner program, called FDXcelerator, an ecosystem designed to facilitate 22FDX system-on-chip (SoC) design and reduce time-to-market for its customers.

Lam Research introduces dielectric atomic layer etching capability for advanced logic

09/07/2016  Lam Research Corp., an advanced manufacturer of semiconductor equipment, today announced that it is expanding its atomic layer etching (ALE) portfolio with the addition of ALE capability on its Flex dielectric etch systems.

SPTS Technologies collaborates with Novati Technologies to establish new plasma dicing line

09/07/2016  SPTS Technologies today announced its collaboration with Novati Technologies to establish Novati’s new plasma dicing line at their fab in Austin, Texas.

SEMI recognizes UMC CEO Po Wen Yen for sustainable semiconductor manufacturing leadership

09/07/2016  SEMI today presented its industry leadership award for sustainable manufacturing to Po Wen Yen, CEO of United Microelectronics Corporation (UMC).

SEMICON Taiwan 2016 opens tomorrow; 43,000 attendees expected

09/06/2016  Upbeat about the growth prospects of Taiwan's semiconductor sector, SEMICON Taiwan 2016 features 600 exhibitors covering over 1,600 booths,and is expected to attract more than 43,000 visitors in three days.

For first time, carbon nanotube transistors outperform silicon

09/06/2016  For the first time, University of Wisconsin-Madison materials engineers have created carbon nanotube transistors that outperform state-of-the-art silicon transistors.

ZEISS launches a new high performance wafer and mask tuning system

09/06/2016  ZEISS introduces the new ZEISS ForTune system for photomask tuning. With its latest optical design, it takes two main mask tuning processes to the next level in terms of efficiency, accuracy and throughput. The first tool has already been delivered to the first customer.

SEMI European MEMS Summit brings industry leaders to Stuttgart

09/06/2016  Leading sensors and actuators companies will present the latest trends at the upcoming SEMI European MEMS Summit in Stuttgart on 15-16 September 2016.

Thinner wafers are fostering the growth and emergence of new dicing technologies

09/06/2016  Driven by rising demand for thinner wafers and stronger die, dicing technology is evolving.

Cabot Microelectronics appoints Thomas F. Kelly as VP of Corporate Development

09/02/2016  Cabot Microelectronics Corporation announced the appointment of Thomas F. Kelly, Vice President, Corporate Development, which is effective as of September 6, 2016.

Top 4 drivers leading to the growth of the RF IC market

09/02/2016  Technavio analysts forecast the global radio frequency (RF) IC market to grow at a CAGR of nearly 12% during the forecast period, according to their latest report.

Iowa State engineers treat printed graphene with lasers to enable paper electronics

09/02/2016  Iowa State engineers have led development of a laser-treatment process that allows them to use printed graphene for electric circuits and electrodes -- even on paper and other fragile surfaces. The technology could lead to many real-world, low-cost applications for printed graphene electronics, including sensors, fuel cells and medical devices.

Memory for future wearable electronics

09/02/2016  Stretchable, flexible, reliable memory device inspired by the brain.

Semiconductor industry icons to gather at SIA Award Dinner Nov. 10 in San Jose

09/02/2016  The Semiconductor Industry Association today announced more than a dozen semiconductor industry icons, leaders, and founders will come together at the annual SIA Award Dinner on Thursday, Nov. 10 in San Jose to celebrate the 25th anniversary of the Robert N. Noyce Award, the industry's highest honor.

The sapphire industry: Back to the future

09/01/2016  “The sapphire industry is still plagued by overcapacity and rapid price declines,” asserts Yole Développement (Yole) in its latest report Sapphire Applications & Market 2016: LED & Consumer Electronics.

UCF team tricks solid into acting as liquid

09/01/2016  Two scientists at the University of Central Florida have discovered how to get a solid material to act like a liquid without actually turning it into liquid, potentially opening a new world of possibilities for the electronic, optics and computing industries.

Enabling industry collaboration to address critical ATE challenges

09/01/2016  For many years, the ATE industry has been challenged with controlling the cost of both production and development test by implementing innovative approaches and employing clever strategies (e.g., multi-site test implementation, DFT, etc.) to make “ends” meet, so to speak.

ASMC 2017 "Call for Papers" deadline is October 17

09/01/2016  SEMI announced today that the deadline for presenters to submit an abstract for the annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) is October 17.

Technology and Design Architectures and Process Innovations for 7 and 5nm BEOL Interconnects

09/01/2016 

September 14, 2016 at 1 p.m. ET/ Sponsored by Air Products

For a semiconductor technology node, the BEOL definition must support minimal parasitic impact to technology, sufficient reliability, required dimensional scaling from previous nodes for standard cell and custom logic requirements, and high yielding/low cost integration schemes. This webcast will discuss the key BEOL elements and innovations in these areas for the 7nm nodes and beyond. The individual elements are often in conflict with each other, but must be considered in unison to determine the overall best definition.



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Mass Flow Controllers

12/11/2015  In plasma-etch, chemical vapor deposition and many other processes, accurate metering of gas flow into the process chamber is critical.





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VIDEOS

RECOMMENDED TECHNOLOGY PAPERS

New In-Line & Non-Destructive Hybrid Technology for Semiconductor Metrology

XwinSys recently launched the ONYX - a novel in-line and non-destructive hybrid metrology system, uniquely integrating advanced XRF, 2D and 3D optical technologies, designed to meet the current and future metrological challenges of the semiconductor industry. The unique hybrid configuration of the ONYX enables a solution to challenging applications through various analytical approaches and effective SW algorithms.July 06, 2016
Sponsored by XwinSys Technology Development Ltd.

Specialized Materials Meet Critical Packaging Needs in MEMS Devices

Microelectromechanical systems (MEMS) present both unique market opportunities and significant manufacturing challenges for product designers in nearly every application segment. Used as accelerometers, pressure sensors, optical devices, microfluidic devices, and more, these microfabricated sensors and actuators often need to be exposed to the environment, but also need to be protected from environmental factors. Although standard semiconductor manufacturing methods provide a baseline capability in meeting these challenges, the unique requirements of MEMS devices drive a need for specialized epoxies and adhesives able to satisfy often-conflicting demands.May 12, 2016
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NMT: A Novel Technology for In-Line Ultra-Thin Film Measurements

XwinSys identified the semiconductors recent market trends and developed a novel XRF technology, named NMT: Noise-reduced Multilayer Thin-film measurement. This innovative approach can be used for in-line inspection and metrology features, to accurately and precisely analyze single and multi-layered elements in ultra-thin films. NMT novel technology can be utilized for in-line applications ranging from localized ultra-thin film stacks to the inspection of 3D localized features to the analysis of defects involving geometries, voids and material elements. February 23, 2016
Sponsored by XwinSys Technology Development Ltd.

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WEBCASTS

Is the Semiconductor Industry Ready for Industry 4.0 and the IIoT?

September 27, 2016 at 1 p.m. ET / Sponsored by Epicor

An industrial revolution is in the making, equivalent some say to the introduction of steam power at the tail end of the 18th century. Known as smart manufacturing, Industry 4.0 (after the German initiative Industrie 4.0), the industrial internet of things (IIoT), or simply the fourth industrial revolution, the movement will radically change how manufacturing is done. Industry experts will examine the potential for the semiconductor factory of the future, and discuss potential roadblocks.

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SEMICON Europa 2016
Grenoble, France
http://www.semiconeuropa.org
October 25, 2016 - October 27, 2016
The ConFab 2017
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http://www.theconfab.com
May 14, 2017 - May 17, 2017

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