Schott inks EUV deals

September 26, 2003 – Schott Lithotec, Jena, Germany, has signed EUV lithography agreements with a pair of industry groups.

Schott will provide International Sematech, Austin, TX, with advanced mask blanks for extreme ultraviolet (EUV) lithography under a one-year deal.

Schott will also provide EUV mask blanks to industry consortium EUV LLC, as well as the right to use results of the group’s research into EUV lithography. Schott and EUV LLC plan to create a commercially operating EUVL photomask blank by 2006.


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