Schott inks EUV deals

September 26, 2003 – Schott Lithotec, Jena, Germany, has signed EUV lithography agreements with a pair of industry groups.

Schott will provide International Sematech, Austin, TX, with advanced mask blanks for extreme ultraviolet (EUV) lithography under a one-year deal.

Schott will also provide EUV mask blanks to industry consortium EUV LLC, as well as the right to use results of the group’s research into EUV lithography. Schott and EUV LLC plan to create a commercially operating EUVL photomask blank by 2006.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

NEW PRODUCTS

SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...
Automated thickness measurement system speeds production
09/20/2017ACU-THIK is an automated thickness measurement tool incorporating dual contact probes for high accuracy inspection of semiconductor wafers....
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...