Intel invests again in EUV

February 25, 2004 – Intel Corp., Santa Clara, CA, has agreed to make an equity investment in Media Lario International SA, an Italian developer of optical components for extreme ultraviolet (EUV) lithography. The two also have signed an agreement to accelerate the firm’s R&D activity.

The deal follows a similar EUV investment announced last month, whereby Intel said it would invest $20 million over three years in Cymer Inc., San Diego, CA, to help develop EUV laser sources, with commercial deployment tentatively planned for 2009.

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