Toshiba, Synopsys pair for chip design

February 3, 2004 – Toshiba Semiconductor Company has licensed phase-shift mask technology from Synopsys Inc., Mountain View, CA, to help it ramp to volume production of 65nm process chips. Toshiba developed its CMOS5 65nm process technology in December 2002, using 193nm ArF lithography, with an anticipated launch date of April 2004.

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