December 2, 2004 – Applied Materials Inc. and ASML intend to collaborate to speed the development of 65nm and below process equipment technology for the semiconductor industry, the companies said.
As part of this agreement, ASML will deliver one of the world’s first immersion lithography systems, its TWINSCAN(TM) XT:1250i step and scan system, to Applied’s Maydan Technology Center (MTC) in early 2005.
The step and scan system will be used in conjunction with Applied’s broad range of systems at the MTC to develop integration-worthy process tools, demonstrate the manufacturing-readiness of equipment and optimize processes for minimal defects.
The ASML-Applied Materials team will also take advantage of Applied’s process diagnostic and inspection tools in the MTC to speed defect learning of the immersion lithography process. Defects that may arise as a result of working with several new materials can be quickly reviewed and identified, helping to enable the acceleration of 65nm and below process development.