Eight new SEMI standards cover FPDs and MEMS

October 13, 2005 – Semiconductor Equipment and Materials International (SEMI) has published eight new technical standards for the semiconductor, flat-panel display (FPD), and microelectromechanical systems (MEMS) manufacturing industries. The new standards, developed by experts from equipment suppliers, IDMs, and other companies participating in the SEMI International Standards Program, introduce specifications for epitaxial silicon wafers; test methods for measuring mechanical vibrations in FPD handling equipment; MEMS terminologies; and data matrix symbology for automated identification of EUV lithography masks.

The new releases include: D43-1105 Test Method for Mechanical Vibration in AMHS; E142.3-1105 Specification for Web Services for Substrate Mapping; F101-1105 Test Methods for Pressure Regulators used in Gas Distribution Systems; M62-1105 Specifications for Silicon Epitaxial Wafers; P44-1105 Specification for Open Artwork System Interchange Standard (OASIS) Specific to VSB Mask Writers; PR10-1105 Proposed Specification for RF Air Interface between RFID Tags in Carriers and RFID Readers in Semiconductor Production and Material Handling Equipment; PR11-1105 Terminology for MEMS; and T16-1105 Standard for use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks.

Visit www.semi.org/standards for further details about SEMI Standards.

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