ASML receiving EUV parts, sets 2006 litho tools schedule

December 8, 2005 – ASML said it plans to ship 20-25 immersion lithography systems in 2006, including shipments to Japan; its Twinscan XT:1700i tool is now being qualified, with the first one scheduled to be shipped in 1Q06. ASML also said it is prepping two EUV alpha tools for delivery to IMEC and Albany NanoTech in 2Q06.

Toppan Photomasks Inc., Round Rock, TX, said that it has delivered EUV masks to ASML in order to qualify its alpha-version full-field EUV scanner (NA=0.25). The masks were made at Toppan’s Dresden manufacturing campus which opened in 2004.

Meanwhile, Carl Zeiss SMT said it has shipped an optical system for EUV lithography to ASML for use in one of the alpha systems, but did not say when it would ship the second optical system.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>


Leak check semiconductor process chambers quickly and reliably
02/08/2018INFICON,a manufacturer of leak test equipment, introduced the UL3000 Fab leak detector for semiconductor manufacturing maintenance teams t...
Radiant Vision Systems announces new automated visual inspection system
11/06/2017Radiant Vision Systems, a provider of high-resolution imaging solutions for automated visual analysis of devices and surfaces, an...
SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...