IBM announces path for extending chip technique

Feb. 20, 2006 – IBM researchers announced they have found a way to extend a key chip-manufacturing process to generate smaller chip circuits.

IBM scientists said they have created small, high-quality line patterns using deep-ultraviolet optical lithography.

The distinct and uniformly spaced ridges are only 29.9 nanometers wide, less than one-third the size of the 90-nanometer features now in mass production and below the 32 nanometers that industry consensus held as the limit for optical lithography techniques.

The company says its new result indicates that a “high-index immersion” variant of deep-ultraviolet lithography may provide a path for extending Moore’s Law further, thus buying the industry time.

“Our goal is to push optical lithography as far as we can so the industry does not have to move to any expensive alternatives until absolutely necessary,” said Robert Allen, manager of lithography materials at IBM’s Almaden Research Center, in a prepared statement.

The pattern of well-defined and equally-spaced 29.9-nanometer lines and spaces was created on a lithography test apparatus designed and built at IBM Almaden, using new materials developed by its collaborator, JSR Micro of Sunnyvale, Calif.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Entegris announces GateKeeper GPS platform
07/15/2014Entegris, Inc., announced last week the launch of GateKeeper GPS, its next-generation of automated regeneration gas purification system (GPS) technology....
Bruker introduces Inspire nanoscale chemical mapping system
07/15/2014Bruker today announced the release of Inspire, the first integrated scanning probe microscopy (SPM) infrared system for 10-nanometer spatial...
MEMS wafer inspection system from Sonoscan
06/25/2014Sonoscan has announced its AW322 200 fully automated system for ultrasonic inspection of MEMS wafers....