Nikon first out of gates with production immersion tool

February 17, 2006 – Nikon Corp. says it has shipped the world’s first production immersion lithography system to a memory chip manufacturer using 55nm process technologies, and for R&D on 45nm devices. The NSR-S609B ArF immersion scanner, with a hyper-NA projection lens of NA=1.07, was shipped last month.

The system uses proprietary “local fill” technology to eliminate scanner-induced immersion defects, without bubbles, water spots, or backside wafer contamination, while preventing evaporation of the immersion fluid to prevent immersion-related overlay problems, the company stated.
The tool also utilizes a two-step “tandem stage” method, with one step to process wafers at high accelerations and scan speeds, and another for calibrating the tool between wafer exchanges. Nikon claims this two-step method has reduced overlay accuracy to <7nm.

Rival ASML has said it would begin volume production of its immersion litho system targeting 45nm chip manufacturing, the Twinscan XT:1700i (NA=1.20), in 2Q06.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

NEW PRODUCTS

SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...
Automated thickness measurement system speeds production
09/20/2017ACU-THIK is an automated thickness measurement tool incorporating dual contact probes for high accuracy inspection of semiconductor wafers....
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...