SEMATECH, Queensland U. working on high-index immersion photoresists

May 25, 2006 – SEMATECH and the U. of Queensland, Brisbane, Australia, have agreed to codevelop new resists for 193nm immersion lithography, in an effort to extend immersion technology for multiple generations.

The two groups plan to identify and qualify high-refractive-index polymers for 193nm photoresists, part of a broader SEMATECH program to extend immersion litho across three categories: resist, immersion fluids, and lens materials. The Australian government, through its Australian Research Council agency, will support the project with a two-year, $510,000 grant, matched by SEMATECH with cash and contributions including access to SEMATECH’s Immersion Technology Center, as well as project management and logistical resources.

“One of our basic objectives at SEMATECH is to maximize the world’s R&D resources through leverage and creative partnerships,” stated Michael Polcari, SEMATECH president and CEO. “This agreement with ARC certainly exemplifies that aim, and allows us to share expertise with a region that is seeking to become a world leader in microelectronics.”

“The partnership between SEMATECH and the U. of Queensland already has yielded many interesting material platforms, and this grant from the ARC will permit the further research needed,” added Will Conley, a Freescale assignee to SEMATECH.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Dynaloy unveils safer cleaners
11/19/2014In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three...
Entegris' VaporSorb filter line protects advanced yield production
10/21/2014Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. ...
Next-generation nanoimprint lithography technology
10/21/2014EV Group (EVG) today introduced its SmartNIL large-area nanoimprint lithography (NIL) process....