JEOL doubling e-beam tool output

June 5, 2006 – JEOL Ltd. is investing 1.8 billion yen (about US $16 million) to build a new facility that will double its production of electron-beam lithography equipment, according to the Nikkei Business Daily

The company is adding a new facility at its site in Akishima, Tokyo, to double production capacity to about 30 units/year. The four-story structure initially will use the first and second floors for cleanroom facilities, with construction starting next month and projected opening by next summer.

The increased output will include both production-grade mask electron-beam equipment, as well as spot electron-beam lithography equipment used in R&D work, the paper noted.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

NEW PRODUCTS

SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...
Automated thickness measurement system speeds production
09/20/2017ACU-THIK is an automated thickness measurement tool incorporating dual contact probes for high accuracy inspection of semiconductor wafers....
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...