October 26, 2005 – Nanometrics Inc. and ASML Holding NV have entered into a cross-licensing agreement to incorporate Nanometrics’ overlay and critical-dimension control metrology technology into ASML’s lithography systems.
“We are committed to offering our customers extendible, open-architecture Overlay and CD control solutions that scale beyond 32nm,” said John Heaton, president and CEO of Nanometrics, in a statement. “We are extremely pleased to be working with ASML to create solutions that improve lithography performance and economics.”
“Metrology within the scanner is a key element for the current performance of ASML lithography systems. With increased access to advanced metrology technology we see further opportunities for advancements in lithography and wafer patterning,” added Karel van der Mast, senior VP of ASML.