Nikon set to enter photomask glass market

February 8, 2007 – Japan’s Nikon Corp. has invested about 2.3 billion yen (US $19 million) to start producing glass substrates for liquid-crystal display (LCD) photomasks, according to a Reuters report.

The investments include equipment and construction of a new cleanroom at an existing factory in Kanagawa Prefecture near Tokyo. The company, which had earlier indicated it would open up shop making glass materials for LCD and semiconductor manufacturing, expects the unit to generate 7 billion yen ($58.1 million) in annual sales by March 2010.

Japan’s Shin-Etsu Chemical Co. currently hold more than half of the 20 billion yen ($166 million) market for photomask glass substrates, Reuters noted.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

NEW PRODUCTS

SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...
Automated thickness measurement system speeds production
09/20/2017ACU-THIK is an automated thickness measurement tool incorporating dual contact probes for high accuracy inspection of semiconductor wafers....
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...