July 13, 2007 — InterCrossIP Management LLC, a technology licensing and commercialization firm specializing in enabling materials for electronics, solar, MEMS, bioMEMS, and medical applications, has signed exclusive, global license agreements with two organizations for commercialization of a thin film deposition technology platform called PMOD.
Photochemical Metal Organic Deposition (PMOD) technology promises significant advantages in the printing and production of integrated circuits. It is used to deposit thin (<200nm) layers of metals such as Au and Pt, metal oxides such as Al2O3, ZnO and TiO2, and mixed metal oxides such as BaTiO3, PZT and ITO. These materials can be directly patterned to line widths below 5nm.
The licensees are Ceimig Ltd, a specialty chemical manufacturer in Dundee, Scotland that will allow InterCrossIP to arrange for production of PMOD chemistries, from samples to full production volumes; and Simon Fraser University in Burnaby, British Columbia, Canada, which can arrange for application-specific PMOD development projects as requested by interested parties.
According to InterCrossIP, PMOD has several benefits not achievable with other types of deposition:
1. PMOD is a low temperature process, compatible with plastic substrates
2. PMOD has the ability to pattern materials that cannot be etched
3. With PMOD metal lines can be patterned using ink jet printing