OAI adds NIL module for mask aligners

August 1, 2007 – Optical Associates Inc. (OAI) says it has added a nanoimprint lithography module as an option to its mask aligners. The module, either as a new order or retrofit, comes with wafer and mask holder and a nanoimprint controller to control the process steps, plus a “starter kit” of materials, the company said in a statement.

The NIL technology comes from Nanolithosolution Inc., a spinout of Hewlett-Packard that is helping HP get its “crossbar array” interconnects ready for devices maybe by 2010, several nodes sooner than expected.

“OAI chose the HP process due to its one-step Auto Release [imprint mold design] which simplifies the imprint process,” said Charles Turk, president of OAI.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

NEW PRODUCTS

SEMI-GAS Xturion Blixer enables on-site blending of forming gas mixtures
10/03/2017The Blixer provides a cost-effective alternative to purchasing expensive pre-mixed gas cylinders by enabling operators to blend ...
Automated thickness measurement system speeds production
09/20/2017ACU-THIK is an automated thickness measurement tool incorporating dual contact probes for high accuracy inspection of semiconductor wafers....
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...