SST November 2007: Intel’s evolution: Strained silicon to high-k and metal gate

EXECUTIVE OVERVIEW As we head toward Intel’s announced 45nm launch this month, Dick James looks at the changes from the company’s 90nm node transistor, through the 65nm node, and take a few guesses about what we might see in the upcoming 45nm part.

After a slow striptease of process announcements, Intel launched the 90nm Prescott chip in January 2004. The chip sported a number of significant process innovations

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Dynaloy unveils safer cleaners
11/19/2014In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three...
Entegris' VaporSorb filter line protects advanced yield production
10/21/2014Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. ...
Next-generation nanoimprint lithography technology
10/21/2014EV Group (EVG) today introduced its SmartNIL large-area nanoimprint lithography (NIL) process....