Report: Toppan unit prepping 45nm mask volumes

November 12, 2007 – Toppan Chunghwa Electronics is readying mass production of photomasks for 45nm chip production to be ready by mid-2008, following the lead of parent company Toppan Printing, according to Digitimes.

TCE will follow Toppan’s ramp of 45nm masks at sites in Japan and Germany. Work at 32nm is mainly focused in Japan, but development will be “gradually” shared with other sites, says Yuichi Kumamoto, Toppan Printing’s deputy chief director of semiconductor solutions business, cited by the report.

The increasing adoption of “fab-lite” strategies has helped the photomask market, he noted, particularly advanced process work in Taiwan, where TCE aims to secure a 35% market share (excluding TSMC).

Kumamoto also noted that he expects 10% growth in Taiwan’s semiconductor industry, with global photomask sales also seen growing by double-digits next year.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Dynaloy unveils safer cleaners
11/19/2014In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three...
Entegris' VaporSorb filter line protects advanced yield production
10/21/2014Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. ...
Next-generation nanoimprint lithography technology
10/21/2014EV Group (EVG) today introduced its SmartNIL large-area nanoimprint lithography (NIL) process....