New tool set adds NIL capability to SUSS mask aligners

March 7, 2008 — SUSS MicroTec, toolmaker for MEMS, 3D/nano semiconductor, and advanced packaging development and manufacturing, has launched an “advanced nanotechnology” tool set for its mask aligners. The new nanoimprint lithography (NIL) tool enables SUSS aligners to print resist thicknesses from less than 100 nanometers to a few hundred microns with a printing resolution down to a few nanometers.

SUSS explains that UV-NIL, a low-cost production technology based on UV-curing, has been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nanometer geometries. UV-NIL applications with promising prospects include semiconductor, MOEMS, MEMS/NEMS and optoelectronic technologies.

“This toolset can be upgraded on any previously installed SUSS MA6 mask aligner with very limited effort,” the company says.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

LIVE NEWS FEED

NEW PRODUCTS

New AFM with high definition electrical measurement capabilities
04/16/2015The Nano-Observer, designed by Concept Scientific Instruments, is ideal for current and future AFM research applications....
Thin wafer processing temporary bonding adhesive film for 3D wafer integration
03/24/2015 AI Technology, Inc (AIT) is the first known provider of a film format high temperature temporary bonding adhesive for thi...
Dramatic results achieved in cleaving glass using ultra-short pulsed lasers
03/11/2015ROFIN-SINAR, Inc. introduces the SmartCleave FI laser process and the MPS glass handling system for high speed and precise cl...