Advanced Materials CVD and ALD Tool

The AltaCVD chemical vapor deposition (CVD) and atomic layer deposition (ALD) tool from Altatech combines a unique vaporizer technology, chamber design, and gas/liquid panel integration. The combination of a proprietary reactor design and precursor introduction path with a pulsed liquid injection and vaporization is said to enable nanoscale control of thickness, uniformity, composition, and stoichiometry in complex materials. These depositions are reportedly unavailable today with existing techniques.

AltaCVD is suited for plasma-enhanced MOCVD and ALD processes of a range of materials used in logic and memory devices, Microsystems, and 3D integration such as high-K gate dielectrics, metal electrodes, high-K coupling dielectrics and electrodes in MIM and DRAM capacitors, ferroelectric materials, chalcogenide alloys for PCRAM, seedless and self-forming copper diffusion barriers, copper seed layers for TSV metallization, transparent conductive oxides, thin film batteries, electrodes and electrolyte. Altatech Grenoble-Monbonnot, France;


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>


Spectral reflectometer for film thickness measurement
04/08/2014Verity Instruments, Inc. is pleased to announce the availability of its new SP2100 Spectral Reflectometer designed for film thickness measurement f...
New Kimtech Pure G3 EvT nitrile gloves
04/03/2014Kimberly-Clark Professional has introduced a new glove that is designed to provide process protection for the semiconductor and electronics industries....
UVOTECH releases UV-Ozone Cleaning System
04/03/2014Using a UV-Ozone Cleaner, near atomically clean surfaces can be achieved in minutes without any damage to your devices. ...