SUSS adds large area nanoimprint litho to mask aligners

October 7, 2008: SUSS MicroTec, a supplier of solutions for the 3D, MEMS, advanced packaging and nanotechnology markets, announced that the capabilities of its manual mask aligners are now enhanced with a new nanoimprint toolkit that enables them to pattern large areas with repeatable sub-50nm printing capability.

The new technology, called substrate conformal imprint lithography (SCIL), has been developed by Philips Research, Eindhoven/The Netherlands and transferred to SUSS MicroTec in a technology license agreement.

SCIL is bridging the gap between small rigid stamp nano imprint lithography (NIL) application for best resolution and large-area soft stamp usage with usually limited printing resolution below 200nm. Its excellent performance in terms of substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool, especially for applications such as high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation hard disc drives.

The SCIL toolkit can be field-installed on any SUSS MA6/8 mask aligner.

a)

b)

a) SUSS MicroTec Logo printed in Amonil MMS 4 on a SUSS MA6 Mask Aligner. b) Section of U-letter with holes 160nm.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Dynaloy unveils safer cleaners
11/19/2014In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three...
Entegris' VaporSorb filter line protects advanced yield production
10/21/2014Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. ...
Next-generation nanoimprint lithography technology
10/21/2014EV Group (EVG) today introduced its SmartNIL large-area nanoimprint lithography (NIL) process....