SUSS adds large area nanoimprint litho to mask aligners October 7, 2008: SUSS MicroTec, a supplier of solutions for the 3D, MEMS, advanced packaging and nanotechnology markets, announced that the capabilities of its manual mask aligners are now enhanced with a new nanoimprint toolkit that enables them to pattern large areas with repeatable sub-50nm printing capability. The new technology, called substrate conformal imprint lithography (SCIL), has been developed by Philips Research, Eindhoven/The Netherlands and transferred to SUSS MicroTec in a technology license agreement. SCIL is bridging the gap between small rigid stamp nano imprint lithography (NIL) application for best resolution and large-area soft stamp usage with usually limited printing resolution below 200nm. Its excellent performance in terms of substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool, especially for applications such as high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation hard disc drives. The SCIL toolkit can be field-installed on any SUSS MA6/8 mask aligner. a) b) a) SUSS MicroTec Logo printed in Amonil MMS 4 on a SUSS MA6 Mask Aligner. b) Section of U-letter with holes 160nm.