Litho contaminants: Getting ready for EUV

Jitze Stienstra, director, gas microcontamination, at Entegris, discusses the challenges of managing contaminants in leading-edge lithographic processes. When the industry begins using EUV lithography, the materials of construction of the tools, the process materials, wafers, reticles, and the photoresists, will all be potential sources of contamination.


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