(July 20, 2010) — Franklin Kalk, Toppan Photomasks, comments on the big EUV lithography news annouced at SEMICON West. Technical challenges of EUV remain defect management — finding and fixing defects in masks. Pattern mask inspection may not be ready until 2016.
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GOV. SHUMLIN ISSUED THE FOLLOWING STATEMENT OCT. 20 ON THE PLANNED SALE OF IBM VERMONT FACILITIES TO GLOBALFOUNDRIES
GOV. SHUMLIN, STATE AND LOCAL OFFICIALS, AND BUSINESS LEADERS ADDRESS PLANNED SALE OF VERMONT IBM PLANT TO GLOBALFOUNDRIES