Video interview with SEMATECH: EUV on center stage

(August 13, 2010) — In this video interview, Bryan Rice, SEMATECH, discusses the readiness of EUV. SEMATECH is partnering with Carl Zeiss for EUV process development. The next phase will be a blank inspection phase, beginning a few months after SEMICON West. Bryan speaks with senior technical editor Debra Vogler.


EUV was a major topic of conversation at SEMICON West 2010. Learn more in these video interviews on advanced lithography:

Research updates on EUV, mask, cleaning, etc from Leti:

EUV news from SEMICON West with Toppan Photomasks:

ASML: Exposure tool development for EUV:

Also read:

Lithography trends at Sokudo breakfast forum at

and SEMICON West Lesson #2: Capital intensity & EUV at

and visit the semiconductor lithography center from Solid State Technology at


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