Metrology tool debuts for B-SiGe HKMG from CAMECA

January 27, 2011CAMECA unveiled the latest addition to its line of high-end metrology systems: the EX-300 metrology tool targeted for front-end process control of 22nm technology nodes and beyond.

Click to EnlargeThe EX-300 is a versatile metrology tool based on LEXES (Low-energy Electron induced X-ray Emission Spectrometry) technology, notes Dr. Michel Schuhmacher, CAMECA VP and CTO. The tool suits semiconductor fabs integrating new challenging processes, adds Dr. Schuhmacher, offering capabilities for front-end compositional control at and near the surface. The instrument targets front-end process control for 22nm technology nodes and performs metrology of patterned wafers down to 30 × 30µm.

LEXES is a surface probing technique pioneered by CAMECA.  The technology is now well-established for addressing challenges in elemental composition, thickness determination and dopant dosimetry.

CAMECA optimized the performance of the EX-300 for challenging high-k metal gate (HKMG), epitaxial layers such as boron in silicon germanium (B:SiGe) and shallow implants, fulfilling requirements of both rapid device development and high-yield mass production. In addition, the instrument is designed to deliver enhanced long-term stability and minimize mean time to repair (MTTR).

CAMECA designs, manufactures and services scientific instruments for material micro- and nano-analysis. CAMECA is now a unit of AMETEK’s Materials Analysis Division.  Learn more at http://www.cameca.com

Subscribe to Solid State Technology/Advanced Packaging.

Follow Solid State Technology on Twitter.com via editors Pete Singer, twitter.com/PetesTweetsPW and Debra Vogler, twitter.com/dvogler_PV_semi.

Or join our Facebook group

 

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

LIVE NEWS FEED

NEW PRODUCTS

Versatile high throughput SEM from JEOL
11/04/2015JEOL's new JSM-IT100 is the latest addition to its InTouchScope Series of Scanning Electron Microscopes....
Entegris expands CMP filtration technology solutions and research, analytical and manufacturing capabilities
09/04/2015The Entegris filter platform using NMB media now includes the Planargard bulk, Solaris point...
DCG Systems extends circuit edit capability to the 10nm node with the introduction of OptiFIB Taipan
09/02/2015DCG Systems today announces the release of the OptiFIB Taipan circuit edit solution for the most adv...