March 1, 2011 – Business Wire — Nanometrics Incorporated (Nasdaq:NANO), advanced process control metrology provider, launched the Mosaic II turnkey image-based overlay metrology solution for advanced high-volume IC manufacturing. NANO reports an initial delivery to a leading Asian memory customer.
With the launch of the Mosaic II, Nanometrics supports advanced lithography process control, including double patterning processes used on today’s most advanced devices, commented David Doyle, vice president and business unit manager of Nanometrics. "We continue to strengthen our product offerings in this important market with a major Asian customer selecting the Mosaic II system for production line monitoring of their most challenging devices."
The Mosaic II is designed as part of Nanometrics’ Lynx cluster metrology platform, combining Mosaic II with IMPULSE modules onto a Lynx metrology cluster. This configuration would enable image-based overlay, diffraction-based overlay (DBO) and optical critical dimension (OCD) measurements. Earlier generation Caliper Mosaic tools can be field upgraded to Mosaic II capability.
To learn more about the Mosaic II, Lynx cluster metrology, and Nanometrics process control metrology solutions, visit Nanometrics at SPIE Advanced Lithography, San Jose Convention Center, through March 2 at Booth 324.
More SPIE news:
- Dr. Burn Lin of TSMC compares EUV and MEB
- EUV lithography vs EBDW: Interview with Toppan Photomasks at SPIE
- Synopsys lithography verification in Proteus LRC handles EUV, double patterning
- SPIE keynote: Imec installs ASML pre-production EUV scanner NXE:3100
Nanometrics provides advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ website is http://www.nanometrics.com.
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