Imec CNT research: IITC preview

By Debra Vogler, senior technical editor

April 25, 2011 – Imec researchers will present a paper titled "Carbon nanotube interconnects: electrical characterization of 150nm CNT contacts with Cu damascene top contact" at the IITC 2011 Conference (May 9-12, Dresden, Germany).

Click to EnlargeDr. Marleen van der Veen, senior research scientist at imec discussed the research results and their significance in this podcast interview:  Download or Play Now

Van der Veen highlighted the process technologies and steps used to grow the carbon nanotubes (CNTs) and the properties and attributes of the multi-walled CNTs (MWCNT) that resulted (Fig. 1). As noted in the paper, the lower slope for the Al2O3 pre-coated CNT implies a three times better CNT resistivity than the SiO2-coated ones.

Click to Enlarge

Figure 1. Single CNT contact hole resistance as a function of the contact height for CNT coated with SiO2 (solid line) and Al2O3/SiO2 (dotted line).

The researchers took the integration process for 300mm contacts and transferred it to 150nm contact holes compatible with the module for 130nm device technologies (Fig. 2). The researchers maintain that because CNTs grown from different recipes and processed under different conditions can be rapidly benchmarked, they believe that their work will be important for manufacturing CMOS-compatible CNT interconnects, as well as for improving CNT interconnect resistance in advanced CMOS interconnects.

a) Click to Enlarge
b) Click to Enlarge

Figure 2. SEM images from different stages of the integration in 150nm contact holes a) before damascene litho and b) after barrier deposition and Cu fill.

 

More IITC previews:

IBM IITC preview: BEOL interconnect tech for <22nm

Beyond ball shear test: Microprobing chip/package stress at Stanford

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Imec CNT research: IITC preview

By Debra Vogler, senior technical editor

April 25, 2011 – Imec researchers will present a paper titled "Carbon nanotube interconnects: electrical characterization of 150nm CNT contacts with Cu damascene top contact" at the IITC 2011 Conference (May 9-12, Dresden, Germany).

Click to EnlargeDr. Marleen van der Veen, senior research scientist at imec discussed the research results and their significance in this podcast interview:  Download or Play Now

Van der Veen highlighted the process technologies and steps used to grow the carbon nanotubes (CNTs) and the properties and attributes of the multi-walled CNTs (MWCNT) that resulted (Fig. 1). As noted in the paper, the lower slope for the Al2O3 pre-coated CNT implies a three times better CNT resistivity than the SiO2-coated ones.

Figure 1. Single CNT contact hole resistance as a function of the contact height for CNT coated with SiO2 (solid line) and Al2O3/SiO2 (dotted line).

The researchers took the integration process for 300mm contacts and transferred it to 150nm contact holes compatible with the module for 130nm device technologies (Fig. 2). The researchers maintain that because CNTs grown from different recipes and processed under different conditions can be rapidly benchmarked, they believe that their work will be important for manufacturing CMOS-compatible CNT interconnects, as well as for improving CNT interconnect resistance in advanced CMOS interconnects.

a) 
b) 

Figure 2. SEM images from different stages of the integration in 150nm contact holes a) before damascene litho and b) after barrier deposition and Cu fill.

 

More IITC previews:

IBM IITC preview: BEOL interconnect tech for <22nm

Beyond ball shear test: Microprobing chip/package stress at Stanford

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Dynaloy unveils safer cleaners
11/19/2014In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three...
Entegris' VaporSorb filter line protects advanced yield production
10/21/2014Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. ...
Next-generation nanoimprint lithography technology
10/21/2014EV Group (EVG) today introduced its SmartNIL large-area nanoimprint lithography (NIL) process....