NCCAVS on 3D packaging: Bring on the TSVs

by Michael A. Fury, Techcet Group

June 20, 2011 – Seventy attendees comprised the standing room only crowd at SEMI’s HQ for the special June 15 NCCAVS user group meeting on 3D Packaging, co-hosted by three of the Bay Area User Groups: CMP, Plasma Applications, and Thin Film. The presentations will be posted on one or more of these groups at as soon as they are available.

Rob Rhoades, CTO of Entrepix, led off the session with a review of CMP issues unique to through-silicon vias (TSV). Copper is the prevalent choice for TSV metal fill, being used 2


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>



OEM Group expands P5000 capabilities to compound semiconductor substrates
05/25/2017OEM Group has launched the P5000:CS automated single wafer cluster tool for the compound semiconductor market. ...
3D-Micromac launches the second generation of its high-performance microcell OTF laser systems
04/17/2017The high-performance production solution for Laser Contact Opening (LCO) of PERC solar cells achieves a th...
ULVAC launches NA-1500 dry etching system for 600mm advanced packaging systems
03/24/2017ULVAC, Inc. is pleased to announce the NA-1500 dry etching system for 600mm advanced packaging substrates, providing for u...