June 20, 2011 – BUSINESS WIRE — Vistec Lithography Inc., electron beam lithography system supplier, will install a EBPG5200 system at the University of California, San Diego’s Nano3 cleanroom facility, California Institute for Telecommunications and Information Technology (Calit2). The e-beam lithography tool will perform basic and applied research fab, starting with nano-photonics for intra-chip communication, tissue engineering, and nano-magnetic data storage.
The tool will also be used to study radio frequency (RF) micro- and nanoelectro-mechanical systems (MEMS and NEMS); novel photonic phenomena in quantum/classical thermo-electric materials and nanoscale electronic devices; tool development for 1x nm-resolution metrology; negative index metamaterial synthesis; and metamaterials for biomedical sensing and energy harvesting.
The EBPG5200 system uses a 50MHz pattern generator and full 20bit address technology, operating with 20, 50 and 100kV accelerating voltage. Benefits include high resolution and beam stability. It routinely generates "structures less than 8nm on varying substrates sizes, enabling full patterning across a 200mm diameter," reports Rainer Schmid, GM at Vistec Lithography. Also read: ETH Zurich adds Vistec EBPG5200 to nanotechnology center
The purchase was enabled by funding from the Major Research Instrumentation (MRI-R2) program of the National Science Foundation (NSF), with contributions from UC San Diego, its Jacobs School of Engineering, Department of Electrical and Computer Engineering, the UC San Diego School of Medicine, and Calit2/Nano3.
The Nano3 facility provides a synergistic environment for fundamental R&D efforts at the nanoscale with a focus on Nanoscience, Nanoengineering and Nanomedicine. The UC San Diego Division of the California Institute for Telecommunications and Information Technology (Calit2), with Calit2′s division at UC Irvine, house over 1,000 researchers pursuing more than 50 projects.
The Vistec Electron Beam Lithography Group makes electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments.
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Vistec Electron Beam provides electron-beam lithography equipment based on Shaped Beam technology. The Vistec Electron Beam Lithography Group combines Vistec Lithography and Vistec Electron Beam. Learn more at http://www.vistec-semi.com.