SUSS EUV lithography mask management system debuts with imec install

July 13, 2011 — SUSS MicroTec unveiled MaskTrack Pro InSync, a holistic in-fab extreme ultraviolet lithography (EUVL) mask management product that synchronizes mask cleaning, handling, inspection, and storage. The tasks are performed in a single- or cluster-style controlled environment. MTP InSync operates in a zero particle regime to maintain mask integrity when entering the EUV lithography scanner vacuum environment.

The MaskTrack Pro InSync interfaces directly with the specific EUV Dual Pod in a fully controlled environment, allowing direct transfer of the Dual Pod from the scanner to the MaskTrack Pro reticle cleaning tool. It is designed to cluster mask cleaning, transfer and storage of the inner pod in a pristine environment, with optional particle detection and inner pod cleaning.

The first MTP InSync will go to imec in August 2011. In February, imec installed ASML’s pre-production EUVL scanner, the NXE:3100. The installation marked imec’s EUVL research program’s move to the preproduction stage, shifting the focus from mainly an infrastructure study to include now also a manufacturability study. Check out imec president and CEO Luc Van den hove’s remarks on imec’s EUVL program here.

Visit SUSS MicroTec as SEMICON West booth 1707, through July 14 in San Francisco’s Moscone Center. More new SEMICON West products and news from Moscone’s halls here.
 
For further information, go to www.suss.com

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