Applied Materials EUVL mask etch system debuts with multiple installs

September 19, 2011 — Applied Materials (Nasdaq:AMAT) unveiled its Centura Tetra EUV advanced reticle etch system at the SPIE BACUS conference (Monterey, CA). The system addresses changing requirements from transmission photomasks used in optical lithography to reflection photomasks needed for extreme ultraviolet lithography (EUVL).

The much shorter EUV wavelength would be absorbed in a transmission photomask. The EUV light source wavelength is approximately 15x shorter than that of deep ultraviolet lithography. The figure shows a comparison between a conventional photomask and an EUV photomask.

Figure. Photomask sees paradigm change with EUVL. Short EUV wavelength would be absorbed in a transmission mask. SOURCE: Applied Materials.

Applied Materials’ new etch system addresses: 1) being able to handle tantalum (Ta) materials used in EUV masks, 2) using optical emission spectroscopy to determine when to stop the etch process, and 3) minimizing damage to the ruthenium (Ru) surface, which is the stopping layer underneath the absorber.

According to Amitabh Sabharwal, GM, mask etch products, at Applied Materials, end users are experimenting with Ta-based materials and the complex structure required for an EUV mask. Listen to Sabharwal’s interview below. The Bragg mirror alone has 40 alternating layers of molybdenum (Mo) and silicon (Si). When using Ta-based materials,

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Spectral reflectometer for film thickness measurement
04/08/2014Verity Instruments, Inc. is pleased to announce the availability of its new SP2100 Spectral Reflectometer designed for film thickness measurement f...
New Kimtech Pure G3 EvT nitrile gloves
04/03/2014Kimberly-Clark Professional has introduced a new glove that is designed to provide process protection for the semiconductor and electronics industries....
UVOTECH releases UV-Ozone Cleaning System
04/03/2014Using a UV-Ozone Cleaner, near atomically clean surfaces can be achieved in minutes without any damage to your devices. ...