Maskless lithography progress from the IMAGINE Workshop

September 8, 2011 — The 2nd Maskless Lithography IMAGINE Workshop, held September 6, 2011, at the Keio Plaza Hotel in Tokyo, provided an important update on recent progress in the development of multiple electron-beam maskless lithography (ML2) technology. This Leti-sponsored event attracted 40 participants, representing equipment suppliers and integrated device makers, as well as electronic design automation and materials suppliers.

The IMAGINE program is developing a cost-effective, flexible ecosystem for integrated circuit (IC) manufacturing at 22nm and below, using high-throughput maskless lithography based on MAPPER Lithography


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