SPIE BACUS 2011: Having your cake and eating it too

by Jan Willis, eBeam Initiative

October 5, 2011 - The eBeam Initiative held its second annual BACUS event on Tuesday, September 20, to continue to promote greater education and focus on eBeam technologies. Five new members were welcomed to the eBeam Initiative (Applied Materials, IMS Chips, Mentor Graphics, Multibeam, and SoftJin Technologies) bringing the total number of company members to 37.

Kicking off the event was a preview of what would later be named the Best Poster in the session immediately after the event. Dr. Gek Soon Chua of GlobalFoundries presented 20nm results using model-based mask data preparation (MB-MDP) from D2S, co-author of the paper. Their conclusion, backed up with PV Band, mask error enhancement factor (MEEF), depth of focus (DOF) and Via area analysis, was that by using overlapping shots, GlobalFoundries can mimic the ideal OPC data/mask shape to realize lithography performance and at the same time achieve significant shot count reduction. It’s like having your cake and eating it, too.

Another presentation by AMTC’s Christian B

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Spectral reflectometer for film thickness measurement
04/08/2014Verity Instruments, Inc. is pleased to announce the availability of its new SP2100 Spectral Reflectometer designed for film thickness measurement f...
New Kimtech Pure G3 EvT nitrile gloves
04/03/2014Kimberly-Clark Professional has introduced a new glove that is designed to provide process protection for the semiconductor and electronics industries....
UVOTECH releases UV-Ozone Cleaning System
04/03/2014Using a UV-Ozone Cleaner, near atomically clean surfaces can be achieved in minutes without any damage to your devices. ...