22nm node semiconductors: Technical forecasts

January 3, 2012 — Solid State Technology asked top analysts and technologists to provide insights on the transition to 22nm semiconductor devices. Read through all the forecasts, or click by topic, from chip design to lithography, CMP, and materials, to the packaging side of the equation.

Check out the first article, from Dean Freeman of Gartner Inc:
Semiconductor process technology challenges at 22nm

And a design perspective, from Gary Smith of Gary Smith EDA:
At 22nm, leave chip layout to the experts

Defect discussion, with Howard Ko of Synopsys:
First order effects at 22nm

The lithography point of view, with Aki Fujimura, D2S:
Mask-wafer double simulation: A new lithography requirement at 22nm

What 22nm means for the packaging providers, from E. Jan Vardaman, TechSearch International:
22nm requires foundry-to-packaging-house cooperation

An in-depth look at gate stacks and materials, with Mohith Verghese, ASM America:
Strained silicon and HKMG take the stage at 22nm

The role of a mid-node, TSVs, and 450mm at 22nm, with Art Zafiropoulo, Ultratech:
Will 22nm need a mid-node?

The CMP point of view, from Michael A. Fury, Techcet Group:
Startups pave the way to CMP at 22nm

Driving technologies for 22nm lithography, from Franklin Kalk, Toppan Photomasks:
20nm mask technology relies on SMO and DPT

How 3D IC fits into the 22nm equation, with Paul Lindner, EV Group:
3D integration key to 22nm semiconductor devices

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Entegris announces GateKeeper GPS platform
07/15/2014Entegris, Inc., announced last week the launch of GateKeeper GPS, its next-generation of automated regeneration gas purification system (GPS) technology....
Bruker introduces Inspire nanoscale chemical mapping system
07/15/2014Bruker today announced the release of Inspire, the first integrated scanning probe microscopy (SPM) infrared system for 10-nanometer spatial...
MEMS wafer inspection system from Sonoscan
06/25/2014Sonoscan has announced its AW322 200 fully automated system for ultrasonic inspection of MEMS wafers....