President Obama’s Intel visit: Fab 42 update, American manufacturing themes

January 27, 2012 — President Barack Obama visited the Intel Ocotillo campus in Chandler, AZ on January 25, as part of a US tour following his State of the Union address. President Obama’s visit in 2011 (Oregon) was the stage for Intel to announce Fab 42 in Arizona, with a $5 billion investment. The President spoke about Intel’s technological innovation, and manufacturing jobs in America.

When complete, Intel’s Fab 42 will be the most advanced high-volume semiconductor manufacturing facility in the world, Intel asserts. Intel is nearing completion of, and will soon be equipping and ramping production at, three new wafer fabs, with Hillsboro, OR and Ireland joining Chandler. The company plans to begin 14nm production in Chandler when that fab opens in 2013. President Obama noted the world’s largest land-based crane, being used in Fab 42 construction, which is capable of pulling up to 4,000 tons.

Photo. President Barack Obama delivering remarks at Intel’s Fab 42 construction site Jan. 25, 2012.

Obama also acknowledged Intel president and CEO Paul Otellini, who serves on the president’s Jobs Council. "I’m here because the factory that’s being built behind me is an example of an America that is within our reach.  An America that attracts the next generation of good manufacturing jobs.  An America where we build stuff and make stuff and sell stuff all over the world," Obama said in a speech at the location.

Photo. Intel Fab 42 Construction Manager Preston McDaniel welcoming President Barack Obama to Intel’s Fab 42 construction site Jan. 25, 2012.

Fab 42 is employing "thousands of construction workers who will put in more than 10 million hours on the job. When this factory is finished, Intel will employ around 1,000 men and women, making the computer chips that power everything from your smart phone to your laptop to your car," the President noted. He added that Intel invests in start-ups and in education of young engineers, stating, "We can use more engineers all across America." (The full transcript is available via the White House website http://www.whitehouse.gov/the-press-office/2012/01/25/remarks-president-intel-ocotillo-campus-chandler-az)

Figure. Artist’s rendering of the $5 billion new chip manufacturing facility and support buildings to be built at Intel’s site in Chandler, Ariz. The new factory, designated Fab 42, will be the most advanced, high-volume semiconductor manufacturing facility in the world. Construction is underway and is expected to be completed in 2013.

Also read: Intel, Samsung, TSMC semiconductor capex in 2012

Subscribe to Solid State Technology

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Spectral reflectometer for film thickness measurement
04/08/2014Verity Instruments, Inc. is pleased to announce the availability of its new SP2100 Spectral Reflectometer designed for film thickness measurement f...
New Kimtech Pure G3 EvT nitrile gloves
04/03/2014Kimberly-Clark Professional has introduced a new glove that is designed to provide process protection for the semiconductor and electronics industries....
UVOTECH releases UV-Ozone Cleaning System
04/03/2014Using a UV-Ozone Cleaner, near atomically clean surfaces can be achieved in minutes without any damage to your devices. ...