Brewer Science rolls out gen-2 OptiStack lithography patterning products

February 14, 2012 — Brewer Science, advanced lithography patterning materials supplier, uncrated the next generation of its OptiStack system of lithography products for semiconductor manufacturing.

OptiStack system products look forward to enable negative-tone development (NTD), extreme ultra violet (EUV), and directed self-assembly (DSA) patterning; and backward to extend the use of krypton fluoride (KrF) and argon fluoride (ArF) lithography, said Darron Jurajda, director of Brewer Science’s Semiconductor Business.

The OptiStack system includes materials with variable optical properties that work across multiple wavelengths, meeting needs of various substrates and patterning technologies. Existing lithography equipment can be used for newer technology nodes, and implementation time is reduced when ramping new patterning technologies, Brewer Science reports. The materials suit existing KrF, ArF, and ArF immersion lithography equipment, NTD processes, EUV assist layers (for dose reduction and pattern transfer), and DSA substrates and pattern transfer layers.

Brewer Science introduced the OptiStack system about one year ago. This week, Brewer Science and Pixelligent debuted a spin-on hardmask technology for advanced lithography, under the OptiStack name.

Visit Brewer Science at Booth 225 during SPIE Advanced Lithography, this week in San Jose, CA.

Brewer Science makes specialty materials, equipment, and process solutions for applications in semiconductors, advanced packaging/3-D ICs, MEMS, sensors, displays, LEDs, and printed electronics. Learn more:

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