SUSS brings GenISys lithography simulation software onto mask aligners

February 21, 2012 — Semiconductor fab equipment supplier SUSS MicroTec will work with GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, to combine the SUSS MicroTec mask aligner tools with the GenISys simulation software Layout LAB. Combining lithography tools with accurate simulation software will yield more cost-effective chip patterning and device development, the companies expect.

GenISys Layout LAB will be able to accurately model all SUSS MicroTec mask aligner exposure optics. Both parties will market the SUSS MicroTec mask aligner technology with the GenISys lithography simulation software.

SUSS’s MO Exposure Optics technology enables frontend technologies like illumination shaping and mask layout optimization on mask aligner equipment, noted Frank P. Averdung, president and CEO of SUSS MicroTec AG. Chip makers can easily model a large numbers of different source shapes with this technology and GenISys’ professional full 3D simulation platform for optical proximity lithography.

Users can optimize mask layout and exposure conditions by running a large number of simulations overnight on the software, added Nezih Unal, VP of GenISys.

GenISys GmbH develops, markets and supports flexible, high-performance software solutions for the optimization of microstructure fabrication processes. For more information, visit

SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, supplies equipment and process solutions for microstructuring in the semiconductor industry and related markets. For more information, visit

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