TEL joins CEA-Leti’s lithography program IMAGINE

February 16, 2012 — This article was updated by TEL.

February 14, 2012 — Tokyo Electron Ltd. (TEL) will join research organization CEA-Leti’s IMAGINE open, collaborative industrial program on advanced lithography for semiconductor manufacturing. TEL and CEA-Leti have collaborated in different microelectronics manufacturing projects for several years.

IMAGINE supports the development and launch of high-throughput maskless lithography (ML2), a multiple electron-beam (e-beam) lithography technology created by MAPPER BV. It has 15 industrial partners and was just selected for 3 additional years. The group recently reported a breakthrough: MAPPER Lithography tech resolves 22nm lines, spaces, contact holes

Maskless lithography is a strong candidates for future patterning of semiconductor devices, said Toshi Nishigaki, TEL CTBU General Manager & VP, adding that TEL benefits from Leti’s advanced lithography experience.

CEA is a research and technology organization in France, with activities in energy, information technologies, healthcare technologies and defence and security. The Laboratory for Electronics & Information Technology (CEA-Leti) works with companies on technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications. Visit www.leti.fr/en

TEL supplies semiconductor and flat panel display (FPD) production equipment worldwide. TEL is a publicly held company listed on the Tokyo Stock Exchange. Internet: http://www.tel.com.

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