Vistec delivers electron-beam lithography system to ITME researchers in Poland

April 26, 2012 — Vistec Electron Beam GmbH, electron-beam (ebeam) lithography system supplier, sold a Variable Shaped Beam system SB251 to the Institute of Electronic Materials Technology (ITME) in Warsaw, Poland, for R&D on micro-optical and diffractive elements, new materials, and masks for optical lithography.

The purchase decision was made as a result of a European tendering procedure.

Vistec’s electron-beam writer offers high performance and flexibility, said Dr. Zygmunt Luczynski, director of ITME. The Vistec SB251 is a universal system, designed for direct write and mask making exposures. It handles and exposes transparent & non-transparent materials for semiconductor and optics applications. The tool features 50kV electron optics, an address grid of 1nm, and an exposure platform with a stage travel range of 210mm2. Lithography below 50nm is achieved on various substrates, from pieces to 200mm wafers and 7” masks. It also boasts a graphical user interface (GUI), fully automated cassette-to-cassette substrate handling, and the data preparation software package ePLACE (provided by EQUIcon GmbH).

The collaboration between ITME and Vistec began more than 20 years ago, noted Wolfgang Dorl, general manager of Vistec Electron Beam.

As a leading research institute in Poland, ITME is working in the multidisciplinary area of research, development and manufacturing of materials, innovative devices and components for application in electronics, micromechanics and optoelectronics. ITME manufacturing technologies are being developed for single crystals of semiconductor materials, oxide crystals (optical, piezoelectric), super-pure metals, and active glass. Nanotechnologies are widely used in studies of new materials. The Institute develops epitaxial structures for electronic and optoelectronic devices, innovative lasers, photo detectors, sensors, filters, piezoelectrics, and diffractive lenses. The single-crystal growth method invented by Prof. Jan Czochralski is continued at the Institute. Development of this method leads to the subsequent development of highly advanced technologies in a field of semiconductor and oxide single crystals. For more information see: http://www.itme.edu.pl/home-page.html.

The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Lithography and Vistec Electron Beam. Website: www.vistec-semi.com.

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