ITF: Winning together with strategic collaboration

In an exclusive series of blogs, imec’s science writers report from the International Technology Forum (ITF) last week in Brussels. This year, ITF’s theme was “It’s a changing world. Let’s make a sustainable change together”.

Gregg Bartlett, CTO of GLOBALFOUNDRIES, acknowledged that the semiconductor industry has been battered in 2011. The already considerable challenges were magnified by a natural disaster and the global economic malaise. Looking back further in time, it is important to remember that the IC industry has always been a volatile business. But if you look at the long-term picture, averaged over 30 years, you see a tremendous growth. A growth that today in the high-end foundry business, is still close to 20%.

According to Mr. Bartlett, the key to survival in this industry is adaptability and collaboration. Today’s landscape is almost unrecognizable when compared to the days before the existence of dedicated silicon foundries, large fabless design companies, widespread internet connectivity, and entirely unimagined categories of electronic devices. These trends have strengthened the need for a collaborative model of semiconductor design and manufacturing.

At the core of this new model is collaboration—not of the opportunistic or desperate variety, but a truly strategic approach to collaboration that leverages the strengths of each partner, while sharing both the risks and the rewards. It is this strategic approach that brought high-k metal gate to volume production at 32/28nm, and it is this strategic approach that will continue to drive innovation at 20nm and beyond, even in the face of the very challenging barriers in lithography, materials, packaging, and wafer processing.

Jan Provoost, science writer imec

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <strike> <strong>

NEW PRODUCTS

Entegris announces GateKeeper GPS platform
07/15/2014Entegris, Inc., announced last week the launch of GateKeeper GPS, its next-generation of automated regeneration gas purification system (GPS) technology....
Bruker introduces Inspire nanoscale chemical mapping system
07/15/2014Bruker today announced the release of Inspire, the first integrated scanning probe microscopy (SPM) infrared system for 10-nanometer spatial...
MEMS wafer inspection system from Sonoscan
06/25/2014Sonoscan has announced its AW322 200 fully automated system for ultrasonic inspection of MEMS wafers....