ALD partnership enables surface functionalization of powders

June 29, 2012 – Marketwire — Cambridge NanoTech, maker of atomic layer deposition (ALD) technologies, entered a licensing agreement with Ghent University in Belgium to commercialize an ALD particle coating technology. 

Cambridge NanoTech ALD systems are used in the production of semiconductors, flat panel displays, and solid state lighting. The new system, Cyprus, will perform ALD coatings of particles, powders, and small 3D objects with and without plasma. Its rotary reactor architecture optimizes conformal coating without the complexity of traditional fluidized approaches.

"The Cyprus Particle Coating system expands the ability to deposit thin films on powders by utilizing thermal and plasma ALD in a single platform. This in turn and can allow users to take advantage of the full spectrum of additional benefits such as improved nucleation rates, decreased processing temperature, and improved film quality offered by plasma-assisted ALD processes," explains Ganesh Sundaram, VP of technology at Cambridge NanoTech.

Ghent University has been developing its particle and powder coating technologies focusing on surface functionalization uses. "There have been an increasing number of possible applications for nanocoatings on particles and powders emerging over the past decade that require atomic level control of layer thickness and uniformity," said Christophe Detavernier, Professor at Ghent University. "ALD has proven to be a very reliable method for depositing ultrathin, conformal coatings on powders."

Located in Flanders, Belgium, Ghent University is an active partner in national and international educational, scientific and industrial cooperation. Ghent University hosts 32,000 students and 7,100 staff members.

Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra-thin films that are used in a wide variety of research and industrial applications. To learn more about Cambridge NanoTech, please visit


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