Singapore IME, Nikon building R&D lab for sub-20nm semiconductor litho

December 27, 2012 – Nikon and Singapore’s Institute of Microelectronics (IME), a research institute of the Science and Engineering Research Council of the Agency for Science, Technology and Research (A*STAR), are jointly setting up a R&D lab to develop optical lithography technology for semiconductor manufacturing.

The efforts will include multipatterning and directed self-assembly techniques for ArF deep-ultraviolet (DIV) dry and immersion lithography down to 20nm and beyond, targeting applications from logic to high-density and nonvolatile memory, nanophotonics, and nanoelectromechanical systems (NEMS).

For Nikon, the collaboration will add to new capabilities in Singapore, tapping into IME’s infrastructure, process technology, and talent pool to learn future process technology and continue to push ArF immersion litho for several more device nodes. "Nikon will gain knowledge of future process technology and total solution, which will be important for our lithography system development,” stated Kazuo Ushida, president of Nikon Precision Equipment Company. "We are very excited to partner with one of the most advanced and established institute in the Asia region."

For the IME, the Nikon JDA shows how it can develop and nurture a local ecosystem for advanced R&D through industry partnerships, developing advanced technologies from process steps to metrology to materials. "Nikon is an ideal technology partner well-established in technical excellence to help IME enhance and expand our R&D capabilities to meet the needs of the industry,” stated Prof. Dim-Lee Kwong, executive director of the IME.

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