This event was originally broadcast on March 5th, 2013 and is now available for on-demand viewing.
As the semiconductor industry moves toward smaller geometries, manufacturing processes are becoming more complex. In particular, they’re more demanding of all the variable parameters on a process tool, including process gas accuracy. Cutting down on variability in the process positively impacts productivity and yield.
Mass flow controllers (MFCs) are critical to maintaining process control. Now, next generation MFCs like the GF135 from Brooks Instrument are enabling a leap forward in advanced process gas chemistry control. This technology optimizes semiconductor manufacturing processes while moving quality control upstream with features like:
• Integrated rate-of-decay (ROD) flow-error detection without process disruption, identifying and correcting issues before they happen, preventing wasted time and wasted wafers
• Improved process gas accuracy
• Enhanced pressure transient insensitivity (PTI) for critical processes
• Zero stability trending and correction ensuring accuracy at critical low flow set points
• Ultra-fast flow settling time for reduced process cycle time
Learn how you can improve your process yield and uptime – and your bottom line.