SPTS named Supplier of the Year at the Annual MEMS Executive Congress

SPTS Technologies, a supplier of advanced wafer processing solutions for the global semiconductor industry and related markets, was named MEMS Supplier of the Year at the MEMS Executive Congress U.S. 2013 held in Napa last month. Senior executives from the micro-electromechanical systems (MEMS) community came together to discuss latest market and technology developments, and to learn the results of the inaugural Best in MEMS Innovation Awards.

SPTS provides deep reactive ion etching (DRIE) equipment and technology, a key building block in MEMS fabrication. Across the vast array of MEMS devices such as sensors, accelerometers, life science and medical products, etching is the critical process step used to define these microscopic 3-dimensional structures. Delivering the industry’s highest etch rates and fine-tilt control profiles, SPTS’ equipment is the process tool of record used by 28 out of the world’s top 30 MEMS makers

“The fast-paced, growing, MEMS market is a key focus for SPTS, which makes this award especially meaningful for us,” said Kevin Crofton, executive vice president and chief operating officer for SPTS. “Our product and technical teams work tirelessly to contribute to our customers’ success.  This award is a reflection of the collaborative approach that we take to serve this sector of industry.”

“We are thrilled that SPTS Technologies won Supplier of the Year at our first ‘Best in MEMS Innovation Awards,’ which we conferred recently at MEMS Executive Congress US,” said Karen Lightman, executive director, MEMS Industry Group. “As one of the world’s leading providers of advanced wafer processing technologies for MEMS, they are an important contributor to the long-term vitality of our industry.”

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One thought on “SPTS named Supplier of the Year at the Annual MEMS Executive Congress

  1. Rich Toftness

    Congratulations to SPTS. Besides their deep silicon etch they also have a great offering in a Xenon Diflouride etch system.

    Reply

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