Advanced Energy highlights enabling pulsing tech for 2X/1Xnm at SEMICON Korea 2014

Advanced Energy Industries, Inc.  today will highlight its advanced pulsing technology at SEMICON Korea 2014. The company will showcase its single- and multi-level RF pulsing platform, essential for sub 22nm node migration. The RF product lineup includes 400 kHz to 60 MHz power delivery systems with breakthrough features to improve etch rate selectivity, feature profile control and film thickness uniformity. Advanced digital matching networks complete the power delivery system and provide fast and accurate tune-while-pulsing capability to keep pace with the rapid process steps in pulsed plasma applications.

Yuval Wasserman, president of AE Thin Films, said, “Korea has become an innovation center of excellence for these applications, and our distributed R&D model supports our customers’ activities with local development capability.”

In addition to the RF pulsing platform, Advanced Energy will display its other dynamic products for semiconductor and thin-film processing applications, including:

  • Optical fiber thermometers (OFTs), delivering precise multi-channel wafer temperature monitoring and control
  • Remote plasma sources for wafer processing, and point-of-use PFC abatement sources for low COO sustainability
  • DC and pulsed DC power supplies for reliable, cost-effective, custom film deposition for ceramic, metal and reactive PVD

At SEMICON Korea, co-located with LED Korea, Advanced Energy will also debut its MXE high-speed pyrometer—enabling accurate, repeatable measurement and control for demanding MOCVD applications. With up to a 10 kHz read rate, the MXE pyrometer is ideal for processes with high susceptor rotation speeds such as HB-LED growth. Precision temperature measurement, combined with 950 nm wavelength reflectance measurements, significantly enhances product yield.

SEMICON Korea takes place at the COEX Exhibition Center in Seoul, February 12 to 14.

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

LIVE NEWS FEED

NEW PRODUCTS

Pfeiffer Vacuum introduces HiPace 2800 turbopump for ion implantation applications
07/06/2016Pfeiffer Vacuum has introduced the HiPace 2800 IT turbopump that is designed for ion implantation applications....
NanoFocus AG introduces new inspection system for semiconductors industry
05/31/2016NanoFocus AG, the developer and manufacturer of optical 3D surface measuring technology, introduces the new measuring system µ...
Edwards launches new vacuum pumps at SEMICON China 2016
03/15/2016Edwards announced the availability of two new vacuum pump product families at SEMICON China: the iXM Series for semiconductor etch and chemical v...