Advanced Energy highlights enabling pulsing tech for 2X/1Xnm at SEMICON Korea 2014 Advanced Energy Industries, Inc. today will highlight its advanced pulsing technology at SEMICON Korea 2014. The company will showcase its single- and multi-level RF pulsing platform, essential for sub 22nm node migration. The RF product lineup includes 400 kHz to 60 MHz power delivery systems with breakthrough features to improve etch rate selectivity, feature profile control and film thickness uniformity. Advanced digital matching networks complete the power delivery system and provide fast and accurate tune-while-pulsing capability to keep pace with the rapid process steps in pulsed plasma applications. Yuval Wasserman, president of AE Thin Films, said, “Korea has become an innovation center of excellence for these applications, and our distributed R&D model supports our customers’ activities with local development capability.” In addition to the RF pulsing platform, Advanced Energy will display its other dynamic products for semiconductor and thin-film processing applications, including: Optical fiber thermometers (OFTs), delivering precise multi-channel wafer temperature monitoring and control Remote plasma sources for wafer processing, and point-of-use PFC abatement sources for low COO sustainability DC and pulsed DC power supplies for reliable, cost-effective, custom film deposition for ceramic, metal and reactive PVD At SEMICON Korea, co-located with LED Korea, Advanced Energy will also debut its MXE high-speed pyrometer—enabling accurate, repeatable measurement and control for demanding MOCVD applications. With up to a 10 kHz read rate, the MXE pyrometer is ideal for processes with high susceptor rotation speeds such as HB-LED growth. Precision temperature measurement, combined with 950 nm wavelength reflectance measurements, significantly enhances product yield. SEMICON Korea takes place at the COEX Exhibition Center in Seoul, February 12 to 14.