Extending Moore’s Law
Date: January 2014 (Date and time TBD)
Free to attend
Length: Approximately one hour
Registration will be available soon. Click here to pre-register.
Will IC capability, affordability and diversity continue to grow on a Moore’s Law cadence? Will our ability to make ICs denser and transistors smaller and cheaper slow down any time soon? Intel’s Yan Borodovsky will discuss multiple path ahead for the industry to continue Moore’s Law for years to come, from the lithographer’s perspective.
Yan Borodovsky is an Intel Senior Fellow and director of Advanced Lithography in the Technology and Manufacturing Group, responsible for directing multi-generational advanced lithography definition and progress at Intel Corporation. Borodovsky has been involved in the development of lithography tooling and advanced patterning techniques since he joined Intel in 1987 as a staff engineer. He was appointed Intel Fellow in January 1999 and Intel Senior Fellow in November of 2003.
Borodovsky was born in Kharkov, Ukraine, in 1947. He received master’s degree in Solid State Devices and Physics from Politechnical Institute in Tula, Russia, in 1971. After graduation, he joined the Nuclear Research Institute of the Ukrainian Academy of Science, Kiev, as an engineer involved in the research and development of solid state spectrometers of nuclear radiation. He left the former Soviet Union in 1979 and started his work at Syncal Corporation developing high-temperature semiconductor materials for deep space thermoelectric conversion devices.
In 1982, Borodovsky joined Advanced Micro Devices as Lithography Staff Engineer. In 1985, Borodovsky moved to Oregon to join ATEQ Corporation, where he designed and developed optical systems and optical testing equipment for the original CORE 2000 Laser Writer.
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