Date: December 2014 (Date and time TBD)
Free to attend
Length: Approximately one hour
Speakers: To be announced
Registration will be available soon. Click here to pre-register.
EUV lithography has been under intense development for years and appears to be close to production. Yet its delay has the industry searching for alternatives, including double, triple and even quadruple patterning, directed self-assembly, multi-e-beam and nanoimprint. In this webcast, experts will detail various options, future scenarios and challenges that must still be overcome.
Want to sponsor this webcast? Contact Sabrina Straub.