Metrology and Failure Analysis

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Metrology

Date: November 2014 (Date and time TBD)

Free to attend

Length: Approximately one hour

Speakers:

Winfield Scott, Technology Director, Evans Analytical Group

Carlos Beitia, Metrology and Defectivity Manager, CEA-Leti

Registration will be available soon. Click here to pre-register.

Continued scaling and more complex device structures, including FinFETs and 3D stacking, are creating new challenges in metrology and inspection. Smaller defects must be detected and analyzed on an increasingly diverse set of materials. Chip makers are looking for better wafer edge inspection techniques, higher resolution metrology tools, 450mm-capability and new compositional analysis solutions.

 

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