Gigaphoton achieves 92W EUV light source output

Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has successfully achieved 92 W EUV light source output at 4.2 percent conversion efficiency (CE) on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners.

The 92 W output was achieved by irradiating an Sn target (tin droplet) with a solid-state pre-pulse laser and a CO2 laser after combining and optimizing these lasers. Gigaphoton remains committed to continuing its R&D efforts, targeting 150 W output by the end of 2014 and ultimately up to 250 W output for high-volume manufacturing.

The prototype LPP light source that has achieved 92 W output with Gigaphoton’s unique technologies allows emission of EUV by radiating ultra-small tin (Sn) droplets of less than 20 μm in diameter with the solid-state pre-pulse laser and main pulse CO2 laser. In addition, a combination of a high-output superconducting magnet and Sn etching allows suppression of Sn debris caused by radiation. To maximize the life of the collector mirror, a high-output superconducting magnet generates a powerful magnetic field to guide unwanted debris caused by thermal expansion of the tin droplets towards the tin catcher.

“The achievement of 92 W output with our EUV light source is a fruit of the steady-yet-unique R&D efforts that we have made to achieve development of higher output, stable, and lower CoO LPP light sources,” said Hitoshi Tomaru, President and CEO of Gigaphoton, “I believe that Gigaphoton’s expertise and efforts to develop the LPP light source that accelerates development of EUV scanners for HVM will further encourage the industry to introduce EUV scanners as the next-generation lithography tools.”

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.

Leave a Reply

Your email address will not be published. Required fields are marked *

You may use these HTML tags and attributes: <a href="" title=""> <abbr title=""> <acronym title=""> <b> <blockquote cite=""> <cite> <code> <del datetime=""> <em> <i> <q cite=""> <s> <strike> <strong>

LIVE NEWS FEED

NEW PRODUCTS

Pfeiffer Vacuum introduces HiPace 2800 turbopump for ion implantation applications
07/06/2016Pfeiffer Vacuum has introduced the HiPace 2800 IT turbopump that is designed for ion implantation applications....
NanoFocus AG introduces new inspection system for semiconductors industry
05/31/2016NanoFocus AG, the developer and manufacturer of optical 3D surface measuring technology, introduces the new measuring system µ...
Edwards launches new vacuum pumps at SEMICON China 2016
03/15/2016Edwards announced the availability of two new vacuum pump product families at SEMICON China: the iXM Series for semiconductor etch and chemical v...