Entegris, Inc., announced last week the launch of GateKeeper GPS, its next-generation of automated regeneration gas purification system (GPS) technology. Three new GPS gas series products for delivering on-site solutions have been developed on the GateKeeper platform and are now available for semiconductor, compound semiconductor and solar manufacturing processes. The GateKeeper GPS platform offers a variety of new benefits, including a new control system for increased process control performance and new options for gas monitoring.
Building on over a decade of experience, this 4th generation solution is designed to help lower operating costs while ensuring continuous uptime though the use of parallel purification and automated purifier regeneration. This eliminates the need to return a purifier for regeneration or install a replacement purifier, adding efficiency and improving system safety.
“The GateKeeper GPS family of gas purification systems sets new standards for process control in high-volume manufacturing,” said Product Marketing Manager Jeff Hermann of Entegris’ Gas Microcontaminantion Control business. “Customers asked for optimized system designs with more features in a smaller footprint, while reducing operating costs and increasing process control. We are excited to deliver GateKeeper GPS models that meet these requests.”
With an industry-leading, ultra-small footprint, the new GateKeeper GPS platform offers new system options, including gas monitoring features and an on-board back-up system. It also maintains ambient temperature operation which helps keep energy costs lower.
The GateKeeper GPS series (available in HX, DX, and Z2 series) are the first systems available in the new platform and offer a flow rate in the 20-60 meters-cubed/hour (m3/h) range.
The HX series delivers ultrapure hydrogen, nitrogen, or argon gas with output purity in the parts-per-trillion (ppt) levels, while removing contaminants such as H2O2 O2, CO, CO2, and non-methane hydrocarbons. HX series applications include Metal Organic Chemical Vapor Deposition (MOCVD), Atomic Layer Deposition (ALD) and Low Temperature Epitaxy (LTE).
The DX series can deliver ultrapure carbon dioxide (parts per trillion levels), which is required for advanced lithography tools – such as immersion argon-fluoride steppers – while removing contaminants such as acids and bases, refractory compounds, condensable and non condensable organics, and moisture.
The Z2 Series safely delivers XCDA (Extreme Clean Dry Air) purified purge gases to the most advanced scanner platforms, including dry and immersion-based lithography tools. This system removes contaminants such as acids and bases, refractory compounds, condensable organics, and moisture from CDA (compressed dry air) gas.